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Equipment

Thin Film Preparation

  • High vacuum magnetron sputter apparatus for large area coatings
  • High vacuum magnetron sputter facility for multilayers from triple-2" targets
  • High vacuum e-beam and thermal evaporation apparatus + sputtering
  • Photolithography (micrometer structures), Thin film profilometer

Bulk Sample Preparation

  • Preparation unit for toxic powders; cold press apparatus; LN2- ball mill
  • Silica-capsule sealing with turbo-pump

Furnace Laboratory

  • Annealing and melting furnaces (> 2000°C) under protective gas up to 1550°C
  • Arc furnace
  • Flash furnace (Rapid Thermal Annealing)
  • Levitation melting furnace
  • Special joining furnaces

Thermal Analysis

  • MHTC calorimeter, DSC heat-flux 450°C -1600°C and RT -1400°C, drop calorimeter < 1300°C
  • DTA/TG in simultaneous apparatus
  • DTA up to 1550°C, with DSC-plate-sensor up to 1400°C

Phase- and Microstructural Analysis

  • Scanning electron microscope with EDX light element analysis (>boron), WDX and digital image processing
  • X-ray diffractometer with position sensitive detector and optional high temperature chamber (up to 1400°C) and/or glancing angle measurement device
  • Metallography, optical microscopy, chemical lab

Electrical Contact Characterization

  • Contact prober for microcontacts to semiconductors at controlled temperature
  • I-V source-measure unit
  • C-V analyzer unit

Thermodynamic Computer Modeling

  • Software packages and databases for thermodynamic and phase diagram calculations in multicomponent systems, such as:
    • Pandat
    • ChemSage
    • Adamis
    • LUKAS programs
    • Thermocalc
    • TerQuat
    • FactSage

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